Education and Degrees
- Master of Science, Department of Physics, Moscow State University, Russia
- Doctor of Philosophy in Physics and Mathematics, Institute of Chemical Physics, Russian Academy of Sciences
Positions Before 1991
- Head of Laboratory, Institute of Mechanics of USSR Academy of Sciences
- Head of Department, Computing Center of USSR Academy of Sciences
- Head of Department, Institute of Oil and Gas Problems of USSR Academy of Sciences
- Deputy Director Institute of Terrestrial Magnetism, Ionosphere and Radio Wave Propagation of USSR Academy of Sciences
Professional Affiliations
- AIAA Technical Committee on Electrical Propulsion
- International Shock Tube and Wave Society Member
- International Committee on Numerical Methods in Fluid Dynamics
Experience in Plasma Physics For Over 30 Years
Employment History
- April 1996 to present – Colorado Advanced Technology LLC
- Consulting services, Fort Collins, CO
- President and Plasma Physicist. Providing R&D services for ion/plasma sources:
- Design and improvement of ion/plasma sources for low and high energies (10 eV – 1000 eV) and ion beam currents (0.1-10 A) with working reactive and noble gases for industrial application;
- Ion beam assisted deposition (IBAD) processes;
- Biased target deposition (BTD);
- End-Hall gridless ion sources (EHIS);
- Closed-drift ion sources and thrusters (CDIS);
- Magnetrons and ion sources at low and high pressures (10-5- 10 torr);
- Matching ion/plasma sources with power supplies; suppressing instabilities and oscillations;
- Specifics of operations with reactive gases;
- Interaction of ion/plasma sources with targets, substrates and vacuum chamber.
- June 2004 – June 2005 – Veeco Instruments, Fort Collins, CO
- June 2005 – Present: Independent Consultant
- Gridless end-Hall cylindrical and linear sources, hollow cathodes; design and tests.
- March 1991 –March 2004 – Kaufman & Robinson Inc., Fort Collins, CO Plasma Physicist
- Gridless end-Halls, closed drift ion sources and thrusters, gridded ion sources, magnetrons, hollow cathodes, biased target deposition, ion beam assisted deposition; design and tests.